Mesa Wet Etching for Fabrication of Optical Fiber Communications Devices with Low Threshold Current and High Power
Vol. 24, No. 12, pp. 233-238, Dec. 1999
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Cite this article
[IEEE Style]
강명구, "Mesa Wet Etching for Fabrication of Optical Fiber Communications Devices with Low Threshold Current and High Power," The Journal of Korean Institute of Communications and Information Sciences, vol. 24, no. 12, pp. 233-238, 1999. DOI: .
[ACM Style]
강명구. 1999. Mesa Wet Etching for Fabrication of Optical Fiber Communications Devices with Low Threshold Current and High Power. The Journal of Korean Institute of Communications and Information Sciences, 24, 12, (1999), 233-238. DOI: .
[KICS Style]
강명구, "Mesa Wet Etching for Fabrication of Optical Fiber Communications Devices with Low Threshold Current and High Power," The Journal of Korean Institute of Communications and Information Sciences, vol. 24, no. 12, pp. 233-238, 12. 1999.
pISSN : 1226 - 4717
eISSN : 2287 - 3880