Characteristic Analysis of the Asymmetric Coupled Microstrip Lines with Finite Metallization Thickness in the Multilayered Structure
Vol. 25, No. 3, pp. 424-429, Mar. 2000
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Cite this article
[IEEE Style]
윤남일, 홍익표, 박한규, "Characteristic Analysis of the Asymmetric Coupled Microstrip Lines with Finite Metallization Thickness in the Multilayered Structure," The Journal of Korean Institute of Communications and Information Sciences, vol. 25, no. 3, pp. 424-429, 2000. DOI: .
[ACM Style]
윤남일, 홍익표, and 박한규. 2000. Characteristic Analysis of the Asymmetric Coupled Microstrip Lines with Finite Metallization Thickness in the Multilayered Structure. The Journal of Korean Institute of Communications and Information Sciences, 25, 3, (2000), 424-429. DOI: .
[KICS Style]
윤남일, 홍익표, 박한규, "Characteristic Analysis of the Asymmetric Coupled Microstrip Lines with Finite Metallization Thickness in the Multilayered Structure," The Journal of Korean Institute of Communications and Information Sciences, vol. 25, no. 3, pp. 424-429, 3. 2000.
pISSN : 1226 - 4717
eISSN : 2287 - 3880